Characterization of Palladium-based Thin Films Prepared by Plasma-enhanced Metalorganic Chemical Vapor Deposition

Authors

  • Ryszard KAPICA Lodz University of Technology
  • Wiktor REDZYNIA Lodz University of Technology
  • Jacek TYCZKOWSKI Lodz University of Technology

DOI:

https://doi.org/10.5755/j01.ms.18.2.1913

Keywords:

plasma deposition, thin palladium film, Raman spectroscopy, electron diffraction

Abstract

The plasma-enhanced metalorganic chemical vapor deposition (PEMOCVD) was used to prepare palladium–based thin films starting with palladium (II) acetylacetonate precursor (Pd(acac)2) mixed with argon (carrier gas). To characterize chemical structure and morphology of deposited films Raman spectroscopy and electron diffraction techniques were used. The energy dispersive X-ray microanalysis (EDX) was applied to specify composition of films. The film thickness was estimated by ellipsometric measurements.

The obtained results show that the films have various composition depending on deposition parameters. It has been found that the thermal decomposition at 623 K of the films leads to the formation of fine 5 nm – 10 nm size palladium nanoparticles, to which the catalytic activity is attributed.

DOI: http://dx.doi.org/10.5755/j01.ms.18.2.1913

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Published

2012-06-18

Issue

Vol. 18 No. 2 (2012)

Section

METALS, ALLOYS, COATINGS

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