Determination of Thickness and Density of Ultra Thin Iron Films by Grazing Angle Incidence X-ray Fluorescence
An efficient and accurate method to characterize the physical thickness of ultra thin iron films is presented. Fe thin films
were grown directly on n-Si(111) substrates by unbalanced magnetron system. X-ray fluorescence system was applied to
measure coating thickness and perform material analysis. The composition and density of the films were characterized
by measuring critical angle of reflection using X-ray fluorescence. It is shown that XRF analysis allows determination of
thickness of samples potentially important for future technological interest.
The copyrights for articles in this journal are retained by the author(s), with first publication rights granted to the journal. By virtue of their appearance in this open-access journal, articles are free to use with proper attribution in educational and other non-commercial settings.