Design and Analysis of Multilayered Waveguide Structure With Metal-Dielectric Gratings for Sensing With Reflection Narrowband Notch Filter
Developments in micro and nanofabrication technologies have led a variety of grating waveguide structures (GWS) being proposed and implemented in optics and laser application systems. A new design of multilayered nanostructure double-grating is described for reflection notch filter. Thin metal film and dielectric film are used and designed with one-dimensional composite gratings. The results calculated by rigorous coupled-wave analysis (RCWA) present that the thin metal film between substrate and grating can produce significant attenuated reflections and efficiency in a broad reflected spectral range. The behavior of such a reflection filter is evaluated for refractive index sensing, which can be applied inside the integrated waveguide structure while succeeding cycles in measurement. The filter peaks are designed and obtained in a visible range with full width half maximum (FWHM) of several nanometers to less than one nanometer. The multilayered structure shows a sensitivity of refractive index of 220nm/RIU as changing the surroundings. The reflection spectra are studied under different periods, depths and duty cycles. The passive structure and its characteristics can achieve practical applications in various fields, such as optical sensing, color filtering, Raman spectroscopy and laser technology.
Copyright terms are indicated in the Republic of Lithuania Law on Copyright and Related Rights, Articles 4-37.
The copyright for articles in this journal are retained by the author(s), with first publication rights granted to the journal. By virtue of their appearance in this open access journal, articles are free to use with proper attribution in educational and other non-commercial settings.