Micromachining of Diamond-like Carbon Deposited by Closed Drift Ion Source for Cantilevers and Membranes
Keywords:diamond like carbon, free standing films, ion beam deposition, surface micromashining
In the present study production of the freestanding film structures of diamond like carbon (DLC) and DLC containing SiOx (DLC:SiOx) are analysed. Role of the residual stress on the process of the micromachining of the “conventional” hydrogenated DLC and DLC:SiOx deposited by closed drift ion source has been investigated. Substantially reduced level of the internal stress (less than 0.5 GPa) as a result of the diamond like carbon film doping by SiOx was observed. DLC:SiOx free-standing film both cantilever and bridge-shaped with >1 μm thickness were successfully fabricated applying SiO2 as a sacrificial layer by combination of the lift-off technique and wet chemical etching.
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