Synthesis of Cu/Cr Multilayer Thin Films Deposited by Unbalanced Magnetron Sputtering

Abstract

Structure and properties of multilayer Cu/Cr thin films deposited by direct current unbalanced magnetron sputtering were analyzed during this work. The leaked plasma of unbalanced magnetron is strongly confined also to the sample holder region, therefore the sample was exposed to ion and electron bombardment, that can lead to intermixing of layers and metastable Cu-Cr alloy formation. The Scanning Electron Microscope images of sample cross-section showed separate Cu and Cr layers, but Cu peak shift in X-ray diffraction pattern indicates that some Cr atoms are dissolved in Cu layer. Resistance measurement during annealing showed that 10 nm Cr layer on Cu is continuous and protects copper from oxidation in temperatures up to 470 °C.