Surface and Structural Analysis of Carbon Coatings Produced by Plasma Jet CVD
Keywords:carbon coatings, plasma, acetylene, Raman spectroscopy.
Amorphous hydrogenated carbon films were deposited on Si (111) wafers from argon-acetylene gas mixture at
atmospheric pressure by plasma jet chemical vapor deposition. The Ar / C2H2 gas volume ratio was 12 : 1, 60 : 1, and
100 : 1, while the distance between plasma torch nozzle exit and the samples was 0.01 m. Scanning electron microscopy
analysis revealed that the growth rate and surface roughness of the coatings increases decreasing the Ar/C2H2 gas ratio.
The Raman results show an increase of the sp3 bond fraction with decrease of the acetylene gas in argon plasma. The
Fourier transform infrared (FTIR) spectroscopy indicated that the films permeability increases with decreasing Ar/C2H2
ratio. It revealed that the surfaces roughness, growth rate, bonding structure, and optical properties of the carbon
coatings depend on the Ar / C2H2.
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