Sol-gel Derived Optical Coating with Controlled Parameters

Authors

  • Aldona BEGANSKIENĖ, Simas ŠAKIRZANOVAS, Andrius MELNINKAITIS, Valdas SIRUTKAITIS, Aivaras KAREIVA Department of General and Inorganic Chemistry, Vilnius University

Keywords:

antireflection coatings, colloidal silica nanoparticles, sol-gel synthesis, laser threshold.

Abstract

The optical properties and structure of antireflective coatings (AR) deposited from hydrolysed TEOS sol were
characterized in detail in this study. The influence of different parameters on the formation of colloidal silica
antireflective coatings by dip-coating technique has been investigated. For the characterization of colloidal silica films
the UV-visible spectroscopy, laser ellipsometry and atomic force microscopy were used. Using optimal sol-gel
processing conditions (dipping rate – 40 mm/min, coating time – 20 s, and temperature – 20 °C) the colloidal silica
coatings were obtained and characterized in comparison with non-coated glass substrate. The reflectance of AR coatings
increases with increasing the temperature of sol-gel processing. The Nd:YAG laser damage threshold of AR coating
exceeded 15.22 J/cm2 at 1064 nm and 26.82 J/cm2 at 355 nm.

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Published

2006-12-08

Issue

Vol. 12 No. 4 (2006)

Section

ELECTRONIC AND OPTICAL MATERIALS

License

 

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