Microstructure and Surface Morphology of YSZ Thin Films

Abstract

In present study yttrium stabilized zirconia (YSZ) thin films were deposited on Alloy-600 (Ni72/Cr16/Fe8) and optical
quartz substrates using e-beam deposition technique controlling deposition parameters: substrate temperature and
electron gun power influencing thin film deposition mechanism. The dependences of thin film structure and surface
morphology on these parameters were investigated by X-ray diffraction, scanning electron microscopy (SEM), and
atomic force microscopy (AFM). It was found that electron gun power influence the crystallite size and roughness of the
YSZ films. YSZ thin film formation and evolution of surface roughness were analyzed for clarification of the
experimental results by a kinetic model. The model is based on rate equations and includes processes of surface
diffusion of adatoms, nucleation, growth, and coalescence of clusters. Analysis of experimental results done by
modeling explains non-monotonous dependence of surface roughness on substrate temperature and electron gun power
which is resulted by diffusivity of adatoms and the size of clusters.